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filingDate 1987-11-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7c6756a390fecfeeb9f6b1639f02419e
publicationDate 1989-03-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-0290577-A4
titleOfInvention IMPROVED PHOTOSELECTIVE PLATING PROCESS.
abstract A process for photo-selective electroless plating in which a semiconductor substrate capable of absorbing light having a wavelength greater than 300 nm is coated with a solution containing a salt of tin, titanium, or lead. The coated substrate is then selectively exposed to light having a wavelength of 300-390 nm in a negative pattern. The light energy absorbed by the sustrate is transferred to the coating changing the oxidation state of the metal ion of the salt. The selective alteration of the oxidation state of the metal ion may then be used to selectively deposit a precious metal from a salt solution thereof.
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