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filingDate 1988-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 1988-10-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-0286594-A2
titleOfInvention Process for the production of photographically structurable coatings
abstract (i) ein zu beschichtendes Material, gegebenenfalls nach Erwärmung, mit einem Pulverlack enthaltend n(A) eine strahlungshärtbare Verbindung und gegebenenfalls n(B) einen strahlunsaktivierbaren Polymerisatinsinitiator für (A) nelektrostatisch beschichtet wird, (ii) das beschichtete Material erwärmt wird, um ein Schmelzen des Pulvers zu einem Film, der nach Abkühlung fest ist, zu bewirken, (iii) der feste Film in einem vorbestimmten Muster aktinischer Strahlung ausgesetzt wird, bei der die strahlungshärtbare Verbindung (A) und/oder der strahlungsaktivierbare Poly­merisationsinitiator (B) aktiviert werden, so dass in den bestrahlten Bereichen die Komponente (A) ganz oder teilweise gehärtet wird, gegebenenfalls (iv) das beschichtete Material erhitzt wird, und dadurch die belichteten Teile einer thermischen Nachbehandlung unterzogen werden, (v) die Bereiche des Films, die nicht gehärtet sind, durch Entwicklung entfernt werden und gegebenenfalls (vi) das beschichtete Material wieder erhitzt wird und dabei (A) nachgehärtet wird. Process for the production of photostructurable coatings, in which (i) containing a material to be coated, optionally after heating, with a powder coating (A) a radiation curable compound and optionally (B) a radiation-inactivatable polymer initiator for (A) is electrostatically coated, (ii) the coated material is heated to cause the powder to melt into a film that is solid after cooling, (iii) the solid film is exposed to actinic radiation in a predetermined pattern, in which the radiation-curable compound (A) and / or the radiation-activatable polymerization initiator (B) are activated, so that component (A) is wholly or partly cured in the irradiated areas will, if necessary (iv) the coated material is heated, and the exposed parts are thereby subjected to a thermal aftertreatment, (v) the areas of the film that are not cured are removed by development and optionally (vi) the coated material is heated again and (A) is subsequently cured. n n n The process enables the production of photostructurable coatings, e.g. Galvanoresists or preferably solder mask without the use of solvents in the coating, such as liquid resists, and without the use of auxiliary foils, which are required for dry resists.
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