http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0261910-B1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5ac17835c97e6c72213815ca74845386 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-032 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-44 |
| filingDate | 1987-09-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 1994-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_854ee33ca90ccde287d12d8876495663 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_afeffcb5ba2b1dada4097ad8d159162c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aaf65f565a0be3eec4bb55ea4cbef5c2 |
| publicationDate | 1994-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-0261910-B1 |
| titleOfInvention | Water-developable photosensitive plate and its production |
| abstract | A water-developable photosensitive resin plate suitable for the manufacture of a relief printing plate having high resistance to water-based inks, high resilience and excellent form stability, which comprises: (A) a copolymer comprising units of (i) an aliphatic conjugated diene monomer (ii) an alpha , beta -ethylenically unsaturated carboxylic acid and (iii) a polyfunctional vinyl monomer, optionally with (iv) a monofunctional vinyl monomer, the content of the aliphatic conjugated diene monomer (i), the alpha , beta -ethylenically unsaturated carboxylic acid (ii), the polyfunctional vinyl monomer (iii) and the monofunctional vinyl monomer (iv) being respectively from about 5 to 95 mol %, from about 1 to 30 mol %, from about 0.1 to 10 mol% and 0 to 70 mol% based on the combination of those monomeric components; (B) a basic nitrogen atom-containing compound; (C) an ethylenically unsaturated monomer; and (D) a photopolymerization initiator. m |
| priorityDate | 1986-09-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 370.