http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0258417-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f75c33ae35e5d1dc4b05e62ec461c17f |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D9-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-425 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D9-00 |
| filingDate | 1987-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_986539e1a63dec94e674b50dc6abf9a8 |
| publicationDate | 1988-03-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-0258417-A1 |
| titleOfInvention | Photoresist stripper composition and process of use |
| abstract | A composition, for stripping substrates of their photoresist once the protective function of the photoresist has terminated, comprises a mixture of (a) morpholine or an N-alkyl or N-hydroxyalkylmorpholine and (b) pyrrolidone or a N-alkyl or N-hydroxyalkylpyrrolidone, in a proportion by weight of (a) to (b) from about 4/1 to about 0.25 / 1. Said composition is effective in the rapid and complete stripping of a wide variety of photoresists at room temperature or at elevated temperatures below the flash point of the composition. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110484126-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110484126-A |
| priorityDate | 1986-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 105.