| abstract |
Homopolymers or copolymers of organometallic, end-capped polyphthalaldehydes containing the repeating unit of formula I <IMAGE> (I) wherein R1, R2, R3 and R4 are each independently of the other hydrogen, halogen, cyano, nitro, carboxyl, hydroxyl, C1-C4alkoxy, C1-C4alkylthio or C1-C4alkoxycarbonyl, and at least one of the substituents R1, R2, R3 and R4 are a group -Q(R5)3 or -Q(R6)3, where Q is Si, Sn, Ge, CH2-Si or O-Si, R5 is C1-C12alkyl and R6 is C6-C10aryl, are suitable for producing dry-developed, plasma-resistant photoresists required for the production of structured images, especially for microelectronics. |