| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_190f2ea7abdd2f1265af645f217a0070 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-167
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-72
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-74
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 |
| filingDate |
1987-02-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a504ac055e1c6a8e53eaa54b9bca0f5c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3ca5b87098be0392fab14c4ae5002251 |
| publicationDate |
1987-08-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-0233747-A2 |
| titleOfInvention |
Vapor deposited photoresists of anionically polymerizable monomers |
| abstract |
A method for applying a polymeric resist coating of very high molecular weight to a suitable substrate without the necessity of elaborate purification steps and for ensuring adequate coverage of raised regions in three-dimensionally patterned substrates. The method comprises exposing the substrate to be coated to the vapor of an anionically polymerizable monomer of the formula:n CHR=CXYn where X and Y are strong electron withdrawing groups and R is H or, provided that X and Y are both -CN, C1-C4 alkyl for sufficient time to deposit a polymerizable coating thereon. Particularly preferred monomers are 2-cyanoacrylate esters. The monomer condenses and polymerizes on the surface of the substrate to give a highly uniform high molecular weight polymeric coating which is useful as a resist coating in lithographic processes employing plasma or acid etch techniques. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8273257-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8221595-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7435353-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7993538-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2007044035-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8841152-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2007044035-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7524431-B2 |
| priorityDate |
1986-02-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |