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filingDate 1986-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2e3e8968dc43330c9cb4258abce59bc7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2dbd3c6140155ab5ec888018730cde5b
publicationDate 1987-08-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-0231262-A1
titleOfInvention METHOD FOR PHOTOCHEMICALLY EVAPORATING OXIDE LAYERS.
abstract Improved method for depositing an oxide layer on a substrate by exposing said substrate to a selected vapor phase reactive agent and an oxygen-containing precursor comprising nitrogen oxide mixed with molecular oxygen in a proportion predetermined, in the presence of radiation of a selected wavelength. The radiation causes the direct precursor comprising oxygen to dissociate directly to form neutral oxygen atoms which react with the reactive agent in the vapor phase and form the oxide which is deposited in layers on the substrate. The reaction rate to form and deposit the oxide layer is improved by mixing molecular oxygen with nitrogen oxide in the precursor.
priorityDate 1985-07-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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