| abstract |
Compounds of the general formula (I) <IMAGE> and compounds of the general formula (II) <IMAGE> in which R1 represents -OH, -CH2OH, -CH2-OCH3, -CHOH-CH3, -CHO or -CH(OCH3)2, R2 represents methyl or ethyl, R3 represents hydrogen or methyl, and X represents hydrogen or methyl, are disclosed. Processes for the manufacture of certain compounds of formula (I) and for those of formula (II) are also provided. The compounds are useful as perfume materials. |