http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0207551-A1
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_518cd0880a7f689acb94dcd6333cbe4e http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2b8b744d430e252fa21c14c2b8dee176 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0125 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-012 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-008 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-36 |
filingDate | 1986-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a4c0d46826df25bb3778e3ffda05d003 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ff5e2a2a3939bb40064274a9810370e5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d274da9998082feeade03768af33d982 |
publicationDate | 1987-01-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | EP-0207551-A1 |
titleOfInvention | Process for obtaining a photosensitive polymer having a high resolution, developable by plasma, and photolithographic process using this polymer |
abstract | Composition for a high resolution photosensitive resin developable by plasma including a polymer and a photosensitive compound, the polymer being from the family of acrylic and / or poly (vinyl ketones) and the photosensitive compound being from the family of aromatic azides, characterized in what the polymer further contains in a side chain at least one aromatic ring on which at least one chlorine atom (Cl) has been substituted for at least one hydrogen atom (H such as for example: n n n Applicefion: Submicron resolution masks for the realization of semiconductor microcircuits |
priorityDate | 1985-06-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 29.