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filingDate 1986-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a4c0d46826df25bb3778e3ffda05d003
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publicationDate 1987-01-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-0207551-A1
titleOfInvention Process for obtaining a photosensitive polymer having a high resolution, developable by plasma, and photolithographic process using this polymer
abstract Composition for a high resolution photosensitive resin developable by plasma including a polymer and a photosensitive compound, the polymer being from the family of acrylic and / or poly (vinyl ketones) and the photosensitive compound being from the family of aromatic azides, characterized in what the polymer further contains in a side chain at least one aromatic ring on which at least one chlorine atom (Cl) has been substituted for at least one hydrogen atom (H such as for example: n n n Applicefion: Submicron resolution masks for the realization of semiconductor microcircuits
priorityDate 1985-06-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 29.