http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0205040-A2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-163 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-095 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T156-1057 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-0055 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B23B35-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B28B11-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-00 |
| filingDate | 1986-05-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_34ac681337c36417db163beb893ae38a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bde047abab4ff4e5cfa68b5c90c090fb http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f81a9834b700d02008f1f0350dd36211 |
| publicationDate | 1986-12-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-0205040-A2 |
| titleOfInvention | Method for cleaning a workpiece after machining with a cutting instrument |
| abstract | @ The method for cleaning the cuts (24) machined into a workpiece (22) such as a printed electric circuit board, includes the steps of coating the cutting instrument (36) such as a drill bit, with a liquid tracer prior to the cutting operation. During the cutting operation, the liquid tracer becomes mixed with material such as an electrically insulating binder layer (50) disposed, e.g. between opposed metal plates (46,48) of the workpiece (22). Any smear (52) of the insulating layer (50) upon exposed metal surfaces of the cut (24) contains elements of chemical compounds used in thetracer. After extraction of the cutting instrument (36) from the workpiece (22), the latter is placed in a plasma reactor (26) wherein the metal surfaces are etched to remove any smears and debris (52) of the insulation material found on the exposed metal surfaces. The tracer elements, such as deuterium and phosphorus are monitored in the effluent plasma of the reactor (26) to determine when the cleaning of the cuts (24) intheworkpiece (22) is completed. |
| priorityDate | 1985-06-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 55.