abstract |
A semiconductor memory comprises a capacitor with a data storage portion, and an insulated-gate field-effect transistor. The capacitor is formed at the side walls and the base of a groove (17) formed in a semiconductor substrate (10). The first electrode is formed by the substrate surrounding the groove, the capacitor insulation film is formed on the side walls and the base thereof. The second electrode is formed by conductive material integrally formed with the source and drain regions (15) of the insulated-gate field-effect transistor. |