| abstract |
A photopolymerizable composition, suitable for use as an etching-resist ink in the production of printed circuit boards, comprises poly-N-vinylpyrrolidone (A); a compound (B) represented by the formula (I)n wherein each of R 1 , R 2 and R 3 represents independently a hydrogen atom or a methyl group; an acid amide (C) represented by the formula (III)n wherein R 4 represents a hydrogen atom or a methyl group, a monomeric compound (D) containing an acryloyl group or a methacryloyl group and optionally a photopolymerization-initiator (E). |