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filingDate 1985-02-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e214f7586e095174bf70e20eb0274c0d
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publicationDate 1986-01-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-0167703-A2
titleOfInvention A method of homogeneous chemical vapour deposition
abstract In a method of homogeneous chemical vapour deposition in which first (22) and second (20) gases are intermixed at a location (28) in the vicinity of a cool substrate (14) onto which a material is to be deposited, the first gas contains at least one constituent of the material to be deposited and is at a temperature less than its pyrolysis temperature and the second gas is heated (18) to a sufficiently high temperature that the intermixing of the gases causes the first gas to decompose.
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