http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0143969-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9e28032b4dae483384b2f28cb3ee45bc |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/D06P5-155 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/D06P5-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/D06P5-15 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/D06P1-65168 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/D06P5-15 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/D06P5-13 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/D06P5-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/D06P1-651 |
| filingDate | 1984-10-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c1f4de1ea39cf819f4a3960ce15df604 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5856769ea183b38ebc553d1d7a301c78 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b569ffd6ee0e2bd845ca53d2057ab1b7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6438760af1d977efb14120f37cfa1d38 |
| publicationDate | 1985-06-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-0143969-A1 |
| titleOfInvention | Process for the production of discharge resist prints on hydrophobic textile materials |
| abstract | Process for producing etching reserve prints on textile materials which consist of hydrophobic fibers or contain predominantly hydrophobic fibers, one or more white-etchable disperse dyes and optionally one or more etch-resistant disperse dyes being applied from the textile material and then an etching reserve printing paste is printed in the desired pattern, which may additionally contain one or more etch-resistant disperse dyes, the order of printing on the etching reserve printing paste and the printing paste also being interchanged and subsequent heat treatment at 100 to 230 ° C. and using an etching reserve printing paste which uses one or more hydrogen sulfide salts as an etching agent or which contains polysulfanes and / or one or more compounds which have or can form a thiolate structure, optionally in combination with thiourea and / or salts of the Thiocyanic acid. |
| priorityDate | 1983-10-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 139.