| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c30ef07844258792c8c4eac6614ff8d3 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0226 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L61-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L61-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L61-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-72 |
| filingDate |
1984-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8dd5016272c9684db3eea8c2e8458b12 |
| publicationDate |
1985-05-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-0140376-A2 |
| titleOfInvention |
Thermally stable positive resist |
| abstract |
A thermally stable, positive resist is provided which is useful in ultra violet lithography. The positive resist composition contains a polymer system, a sensitizer system, and a solvent for the polymer system and the sensitizer system. The polymer system contains a phenolic resin, and preferably a novolak-type resin compatible with the phenolic resin. The sensitizer system contains a photosensitive agent and a thermosensitive cross-linking agent for the phenolic resin. The photosensitive agent is a diazoketone compound insoluble in aqueous alkaline solution that absorbs radiation in the near ultra violet region of the spectrum providing decomposition products soluble in aqueous alkaline solution. The thermosensitive cross-linking agent is a bisarylazide compound that absorbs radiation in the deep ultra violet region of the spectrum and that cross-links the phenolic compound when exposed to elevated temperatures. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0962825-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0364949-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6514656-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0364949-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0919868-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6440632-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0962825-A1 |
| priorityDate |
1983-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |