http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0134249-A1

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filingDate 1984-01-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2dc8f0892534f4f02ba4c4c9362689b2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_45252dcbf711b474ce59650474ec7792
publicationDate 1985-03-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-0134249-A1
titleOfInvention Process for the production of a thin-film dielectric
abstract A thin-film dielectric comprising a conductive substrate having formed thereon a thin layer of a ternary composition of lead titanate zirconate or lanthanum-containing lead titanate zirconate (PLZT) prepared by adding an ingredient represented by the formula Pb(M' 1/3 M' 2/3 )O 3 (wherein M' represents a divalent transition metal, and M' represents Ta or Nb), as a third component to lead titanate (PT) and lead titanate zirconate (PZT) to form a solid solution. The total film thickness of the dielectric composition is 0.1 to 100µm. The thin-film dielectric is produced by coating the substrate with an organic solvent solution of β-diketone or the like as a precursor for said dielectric in a uniform thickness, prebaking at a temperature higher than the decomposition temperature of the organic material contained in the coating and lower than the crystallization temperature of the dielectric in an oxygen-containing stream, repeating the coating-prebaking procedure, then fully baking at a temperature higher than the crystallization temperature of the dielectric composition or repeating the coating with the precursor solution and the full baking procedure.
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