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filingDate 1983-08-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 1984-08-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-0106977-A3
titleOfInvention Method and apparatus for electrochemically treating a substrate
abstract A laser enhanced electroplating system or etching sys­ntem or conventional electroplating or etching system in­ncludes a continuous electrochemical processing system nwith a sheet of material to be treated electrochemically npassed from a supply roller to a plating bath and out over nan exit roller with the plating system under automatic con­ntrol. A rinse-tank is also proved in series with the plating ntank. The sheet to be treated electrochemically is coated in ntank (21) with a protective film which prevents electrochemi­ncal action from occuring where it is present, but which sheet ncan be removed in a predetermined location. The protective nfilm is removed where desired to provide a mask by means nof a laser (27) which is scanned under automatic control. nThen the plating or etching operation occurs through the nopenings in the mask. A rinse-tank contains a solvent cap­nable of removing the mask from the sheet subsequent to the nplating or etching operation. An array of lasers can be nemployed. An array of lasers can be multiplexed, syn­nchronously activated or pulsed. The electrochemical opera­ntion can be performed with the concomitant application of nenergy from the laser in order to enhance the chemical naction in areas from which the masking (protective) film has nbeen removed. The laser can be scanned by means of a nmirror, which oscillates or can be fixed. The masking ma­nterial is composed of an organic material such as glycol nphthalate, paraffin, photoresist, gelatin, etc.
priorityDate 1982-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 43.