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filingDate 1983-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_278ad883c6868c38285b5528c5e6a5b6
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publicationDate 1984-04-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-0104954-A2
titleOfInvention Multilayer dry-film photoresist
abstract O A dry-film, laminable photoresist of at least two layers, comprising:n a) a first layer of a photoresist layer, said first layer becoming more or less soluble in an aqueous alkaline solution or organic solvent after exposure to actinic radiation, and (b) a second layer, adjacent and adhered to a surface of said first layer, of a laminable crosslinked or crosslinkable organic polymer which is soluble in an aqueous alkaline solution or organic solvent. n The use of a thermoplastic, crosslinked or crosslinkable integral adhesive layer on the dry-film photoresist layer improves the properties and performance of the photoresist.
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priorityDate 1982-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 39.