http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0090615-A2

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_80787665b837ed3eb503bbcd27c0043a
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-095
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-095
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09
filingDate 1983-03-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4904db5cba45ab6635018a3d2e20ddf4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_679a79c013c60580a1e267f1792a3869
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_75f0131c4b37313673d9af5409ad480f
publicationDate 1983-10-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-0090615-A2
titleOfInvention Method for forming fine resist patterns
abstract A fine resist pattern having high sensitivity and steeply improved residual film ratio is obtained by forming a multilayer film (2, 3) consisting of organic substances on a substrate (1), making an upper layer (3) of said multilayer film contain metal elements, irradiating said multilayer film with light or radiation (7), and developing with plasma.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-8604695-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0261315-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5676866-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0200477-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0200477-A3
priorityDate 1982-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S57168247-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S57168246-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0067066-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0067067-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S57205739-A
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415741652
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID408758511
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415010189
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559309
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6511
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6392
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419601022
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID66188
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID16682930
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID13586
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID75819
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID414862618
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415733500
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415783421
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID66339
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID136618
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID11661
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415997649
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415733502
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID75121
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419527441
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6570
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID18430
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419580923
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419580427
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415794127
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5284490
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID13143
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID66190
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419530116
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID411613031
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415755949
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID977
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415833228
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID87525
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID16638
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID7838
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID637923
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457000845
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415757908
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID426068864
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID11704
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419545752
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419515635
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419594747
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419523291
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419578839
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID69144
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID408671671
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID414870862
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6394
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID530370
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID3001055
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID94242
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID57376941
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID79102
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID12426
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415733816

Total number of triples: 83.