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filingDate 1983-01-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9aa63ebdd9546a3e04eaf9e1776f936a
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publicationDate 1983-09-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-0087582-A2
titleOfInvention Optical lithography process for creating patterns in a silicon semiconductor substrate
abstract The invention relates to an optical lithography process for creating patterns in a silicon semiconductor substrate. The improved resolution, as used in the very large scale integration of electronic circuits, is obtained by employing a thin film of 4-phenylazo-1-naphthylamine between the silicon substrate and the overlying layer of a light sensitive photoresist. The 4-phenylazo-1-naphthylamine acts as a stable, highly light absorbent medium exhibiting chemical and physical compatibility with the silicon substrate and photoresists with ether-type solvent systems.
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