http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0070624-A1
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_621311453f1086c9b716788464fa7ea5 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-41 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0236 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-41 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-24 |
filingDate | 1982-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_750a038169041dbdcd84a11a22dcdc60 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_50616bfda58a473a65714a340acd2fc2 |
publicationDate | 1983-01-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | EP-0070624-A1 |
titleOfInvention | Novolak resin and a positive photoresist composition containing the same |
abstract | Fast positive photoresist compositions and novel cresol-novolak resins for use in producing the same made from a mixture containing meta- and paracresol or ortho-, meta- and paracresol in a ratio selected from a given range. The photoresist compositions include these novolak resins and one or more of a selected group naphthoquinone diazide sensitizing compounds. When dissolved in a mixture of organic solvents, the photoresist compositions are suitable for application as a thin coating to a substrate. After the coating has been dried, the coated substrate can be exposed to imagewise modulated actinic radiation even in the deep ultraviolet range and developed in alkaline solution, yielding a high-resolution relief pattern of resist on substrate useful for a number of applications. |
priorityDate | 1981-06-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 80.