| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_60e21de07fa18fc54e2150daffc14654 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S148-131
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S148-05
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S438-963
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S438-951 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76224
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0272
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-7688 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-762
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
1982-04-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e447285d983128c6feba6a88e23d1ed9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_402965449f9d60d832ea18441f12add4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_95b7a475ebcfb111de9d8ed127f401e0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4c720f69554407b76b2c9729c4611729 |
| publicationDate |
1982-11-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-0063917-A1 |
| titleOfInvention |
Method of manufacturing a semiconductor device |
| abstract |
A semiconductor device in which a film of insulator or conductor is closely deposited in a groove formed in a semiconductor substrate or an insulating or conductor layer thereon to planarize the surface thereof. n A semiconductor device manufacturing process in which a specimen is selectively etched away using a resist pattern as a mask, a pattern-forming film is deposited by a plasma deposition technique on the specimen, and the resist film is removed, whereby the pattern-forming film fills up a groove formed by etching to provide a planarized surface. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/FR-2675947-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5242853-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5202286-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6387713-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/FR-2643745-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0392642-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0424905-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0424905-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5250451-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0140817-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0140817-A2 |
| priorityDate |
1981-04-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |