| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_621311453f1086c9b716788464fa7ea5 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0125
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08C19-10 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-012
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F8-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08C19-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F8-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate |
1982-04-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b7257bac96533001ae1ea817316094dc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_750a038169041dbdcd84a11a22dcdc60 |
| publicationDate |
1982-10-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-0063043-A1 |
| titleOfInvention |
Cyclized rubber film-forming negative photoresist composition |
| abstract |
A cyclized rubber film-forming negative photoresist composition which is comprised of a cyclized rubber polymer and an aryl bis-azide sensitizing compound which decomposes upon exposure to image-modulated light of selected wavelengths to yield a structure capable of inducing cross-linking of the polymer in the exposed areas of the composition. The cyclized rubber polymer is characterised by a narrow polydispersivity which is greater than 1.865, an unsaturation range of between about 6.0 to about 8.2 millimoles/gram, and an appropriate range of weight average molecular weights. The film-forming photoresist composition has both a high window-opening index and a high photospeed. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0110356-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110824843-A |
| priorityDate |
1981-04-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |