http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0057162-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3e9445e5e3626f36e932c6451a928250 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-124 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-109 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-107 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-032 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-031 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-032 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-00 |
| filingDate | 1982-01-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4cf0381100046c08c151857ae1ea46a7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cd9086a0f10845bb6e922d4dafe5e2ba |
| publicationDate | 1982-08-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-0057162-A1 |
| titleOfInvention | Process for the production of images |
| abstract | One method of forming images by a positive resist method is to (1) make a photoresist composition consisting of (1) a film-forming organic material with at least one substituted benzoin group of the formula wherein R 'represents a hydrogen atom, an alkyl, cycloalkyl, cycloalkylalkyl or aralkyl group or a group - (CH 2 ) b X, R 2 represents a hydrogen atom or an alkyl, cycloalkyl, cycloalkylalkyl, aryl or aralkyl group, R 3 represents a halogen atom or an alkyl, alkoxy, cycloalkyl, cycloalkylalkyl or phenyl group, X represents a halogen atom, an alkoxy group, a phenoxy group, a group -COOR 4 or a group -OOCR-, where R ß is an alkyl group means, and a is zero or 1, b is an integer from 1 to 4, m and n are each zero or 1, the sum of m + n = 1, p and q are each zero or 1, the sum of p + q = 1, and c and d are each zero or an integer from 1 to 3, and (b) a compound which is polymerizable under the action of a radical catalyst to give higher molecular weight material which is more soluble in a developer than the composition before exposure, so that the solubility of the composition in the developer in the exposed Part increases, is exposed imagewise to actinic radiation and (2) the composition is treated with a developer to remove the exposed part. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0161427-A2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0161427-A3 |
| priorityDate | 1981-01-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 395.