http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0056138-A1

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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32
filingDate 1981-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e523e07c9d0984c31c008ce508f07e3d
publicationDate 1982-07-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-0056138-A1
titleOfInvention Process and developer composition for the development of exposed negative-working diazonium salt layers
abstract The invention relates to a developer mixture for developing exposed light-sensitive reproduction layers which contain a diazonium salt polycondensation product. The mixture is based on water, a salt of an alkanoic acid and a surfactant and contains 0.5 to 15% by weight, in particular 1 to 10% by weight, of at least one salt of an alkanoic acid with 8 to 13 carbon atoms and 0.5 to 20% by weight, in particular 1 to 12% by weight, of at least one low-foaming, nonionic surfactant. These surfactants preferably include optionally modified block polymers of ethylene and propylene oxide.n n n The invention further relates to a method for developing negative working reproduction layers of the above composition with the developer mixture according to the invention.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0180122-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0180122-A2
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6007970-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0556014-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0555098-A1
priorityDate 1981-01-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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