http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0054201-A2

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-34
filingDate 1981-11-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8e3a0cc812820818d04b494dccbeb4b9
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publicationDate 1982-06-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-0054201-A2
titleOfInvention Dry etching device and method
abstract A dry etching method and device involve induction of a magnetic field having field lines perpendicular to an electric field by magnets (28a, 28b, 28c) which are arranged in the vicinity of a cathode (21) within a reaction chamber, on the surface of the cathode (21) being placed a sample (30) to be etched by a plasma of an etchant gas.
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8796069-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7910490-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10304962-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7932521-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8669550-B2
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priorityDate 1980-12-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 30.