| abstract |
Solvent-soluble polymeric esters and polymeric ester- ethers with radiation-crosslinkable ethylenic unsaturation in the linear polymeric structure, and recurring pendant hydroxyl groups, are derived from monomers which include diepoxides and monomers with at least one α,β-unsaturated carboxylic acid group. These polymeric products react with cyclic anhydrides to form aqueous alkaline-soluble polymers which are useful as films for photomechanical processes, including lithographic applications and as ' photoresists. |