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filingDate 1979-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d09b6a179ca21269f82549fde8bac40a
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publicationDate 1980-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-0008394-A1
titleOfInvention Process for developing exposed light-sensitive printing plates containing o-naphthoquinone diazides
abstract A process is described for developing exposed photosensitive printing plates with a layer support of anodically oxidized aluminum and a photosensitive layer which contains an o-naphthoquinonediazide and an alkali-soluble resin, in which the exposed areas of the layer are washed out with an aqueous alkaline developer solution that the development in the presence of an ionizable compound of an element of the 11th or III. Main group or III. Subgroup of the periodic table. The ionizable compound can be contained in the developer solution or in the printing plate and has the effect that the oxide layer is less attacked.
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priorityDate 1978-08-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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