| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-143 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-095
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-68 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-14 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-095
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-68
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-74 |
| filingDate |
1978-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1e4388ece661aef71c0bd3272e11d91f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3d5115bbc5133eae9c6957793d6d6767 |
| publicationDate |
1979-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-0002795-A2 |
| titleOfInvention |
Process for the fabrication of masks for lithographic processes using a photoresist |
| abstract |
Method for producing phototack (photoresist) masks for lithographic processes, in which at least a second photoresist layer (22) saturated with a diluent is applied to a first photoresist layer (21) and in which the photoresist layers have different development solution rates for formation have so-called undercut profiles. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0034794-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-9527924-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0397441-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0397441-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0141389-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0141389-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0346650-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0346650-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0163089-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-2124399-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0844090-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0844090-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0163089-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2008035059-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111584707-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111584707-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2008035059-A2 |
| priorityDate |
1977-12-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |