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filingDate 2005-01-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b3b252163916ff134f2239756c022e55
publicationDate 2008-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EA-010748-B1
titleOfInvention METHOD OF FORMING A THREE-DIMENSIONAL MICROSTRUCTURE ON THE SURFACE, ITS APPLICATION AND OBTAINED THEREFORE MICROSTRUCTURED PRODUCTS
abstract A method of forming a three-dimensional microstructure on a flat surface of the base, comprising applying the first flat and uniform layer (2) of silicone onto the specified surface of the base (1) and applying to the first layer of silicone a second three-dimensionally microstructured layer (3) of silicone, with the first layer and the second layer of silicone become seamlessly connected in order to create in this way a common three-dimensional microstructure, which provides anti-adhesive properties evenly distributed over the substrate surface, so that any flexible surface substrate, in particular a surface of adhesive deposited on said layers of silicone will be microstructured by inverse playback three-dimensional microstructure formed by the two layers of silicone, said layers of silicone are fixed by curing by heating or under UV or electron irradiation, or a combination thereof; its use and films, in particular self-adhesive films, such as films microstructured by this method.
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