| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_52a65b677bbedbe7bf090dd556a7cc43 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-037
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-106
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L83-10 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L79-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L83-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-10 |
| filingDate |
1994-02-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3cf43f467424381f9b50039e84fd8345
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_be3bd166e065bad352641cc1efd3796a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_27d788f789fa3a71c2e29aa0cdf40459
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_04ce2bf1d25815e7917df93dd2c7ab27 |
| publicationDate |
1994-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
DE-4406282-A1 |
| titleOfInvention |
Photosensitive resin composition |
| abstract |
A photosensitive resin composition comprises (I) a compound for generating an acid on irradiation with light and (II) at least one polyimide precursor which is: (a) a silicon-containing polyimide precursor obtained from A mol of a tetracarboxylic dianhydride or a derivative thereof formed by adding 2 mols or less of a monovalent saturated alcohol to 1 mol of the tetracarboxylic dianhydride; B mol of a diamine and C mol of an aminosilicon compound of the formula: <IMAGE> [wherein R<1> is (CH2)s-, -(CH2)s <IMAGE> (wherein s is an integer of from 1 to 4); R2 is independently an alkyl group having 1 to 6 carbon atoms, a phenyl group or a phenyl group substituted by an alkyl group having 7 to 12 carbon atoms; X is a hydrolytic alkoxy group; and k is 1 </= k </= 3]; in a ratio satisfying the formulae <IMAGE> (b) a silicon-containing polyamic acid ester obtained by esterifying the precursor (a) with a monovalent saturated alcohol; or (c) a partially esterified silicon-containing polyamic acid ester (c) obtained by partially esterifying the precursor (a) with a monovalent saturated alcohol. o |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1087263-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100737206-B1 |
| priorityDate |
1993-02-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |