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filingDate 1993-04-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 1994-05-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_551b3cc3a93b58d463d91f77f91ee8d3
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publicationDate 1994-05-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber DE-4313130-C1
titleOfInvention Process for the preparation of silanes or organosilicon hydrides by reducing the corresponding silicon halides or organosilicon halides
abstract A process for the prodn. of silanes and organosilicon hydrides (I) comprises redn. of corresp. Si halides and organo-Si halides (II) with Mg hydride (III) in a liq. medium (IV). (III) is a non-pyrophoric "storage Mg hydride", (IV) are ordinary ethers, and the Mg halide deposited on the surface of (III) during the reaction is continuously removed by the action of mechanical energy or ultrasound to form a fresh surface. USE/ADVANTAGE - (I) are used for the prodn. of monomeric or polymeric organo-Si cpds. The invention provides a simple, economical process for the prodn. of (I) in almost quantitative yield. and high purity, with high selectivity, using non-pyrophoric Mg hydride in ordinary ethers, and continuously renewing the reactive surface of the hydride.
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type http://data.epo.org/linked-data/def/patent/Publication

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