http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-4107926-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6c33d23c4038f0a2a42854492ec61ee9 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0755 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 |
| filingDate | 1991-03-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_166ffeb09bcfddf7cb509b9411cacd13 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0217f03dde2ffedf5a180be06ccf8d28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1529166e1f082ebabd9196f07df80bbe http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c58544b62d73801c866b0bc8444441db http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ea04e559050ed6243ec0818f404c2aeb http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_917d30ec37bbbc9d0fee85cad7abf811 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_db9e4f02299a65dfa0e26ba463a51c22 |
| publicationDate | 1992-03-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | DE-4107926-A1 |
| titleOfInvention | PLASMA RESISTANT, POSITIVE WORKING PHOTOCOPYING LACQUER |
| abstract | Lacquers acting as single-layer resists or as the top layer for two-layered systems, comprise a 1,2-naphthoquinone-2-diazide deriv., a phenol resin, an Si-contg. substd. benzoic acid and a solvent or solvent mixt. where the 1,2-naphthoquinone diazide deriv. comprises a cpd. of general formula (I) or (II) as well as a benzoic acid of general formula (III), and the amt. of the Si-contg. formula (III), and the amt. of the Si-contg. benzoic acid comprises 10-100 wt.% of the total wt. In the formula, a gp. of formula (IV). R= alkyl, and n= 0, 1 or 2. Compsn. is pref. 5-tris-(trimethyl silyloxy)-silyloxy -1,2-naphthoquinone- 2-diazide together with tris-(trimethylsilyl -methylbenzoic acid are used. USE/ADVANTAGE - Useful in photocopier lacquers (claimed) giving resistance to oxygen plasma, good compatibility with the photolacquer component and no impairment of the lithographic parameters of the photocopier lacquer. (4pp Dwg.No.0/0) |
| priorityDate | 1990-09-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 40.