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filingDate 1986-01-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 1993-02-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0e4536274d13ac5ded30f9491d1aae04
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publicationDate 1993-02-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber DE-3687416-D1
titleOfInvention LIGHT SENSITIVE RESIN COMPOSITION FOR STENCIL PRINT.
abstract Compsn. comprises (a) film-forming high polymer, (b) photo-crosslinkable polyvinyl alcohol which contains at least one photo-crosslinkable constitutional repeating unit selected from those of formula (I), (IV) and (V), and (c) diazo cpd.. In I, A is gp. of formula (II) or (III); (where R1 is H, alkyl or aralkyl, which may contain hydroxyl, carbamoyl, ether bonding, or unsatd. bonding; R2 is H or lower alkyl; and X- is acid anion), m is 0 or 1, and n is 1 to 6); B is aromatic or heterocyclic residue having at least one polar gp.; and m and n have the same meaning as in (I), respectively. Film-forming high polymers include vinyl acetate emulsion, acryl emulsion, ethylene-vinyl acetate emulsion, SBR latex, vinyl chloride emulsion and the like. Pref. photo-crosslinkable polyvinyl alcohol has saponification degree of 75 mol.% or more and mean polymerisation degree of 300-3,000. Pref. fraction of photo-crosslinkable constitutional repeating unit is 0.5-10 mol.%. Pref. ratio of film-forming high polymer to photo-crosslinkable polyvinyl alcohol ranges from 100 : 10 to 100 : 200. Pref. mixing ratio of combination of film-forming high polymer and photo-crosslinkable polyvinyl alcohol to diazo cpd. ranges from 100 : 0.01 to 100 : 2 by wt..
priorityDate 1984-07-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 43.