abstract |
Electrophotographically sensitive element, having photoconductive amorphous Si layer(s) on an Al-based substrate, has a substrate contg. Fe and/or Mn in an amt. of max. 0.30 wt.%. The substrate contains max. 0.30 wt.% Fe and/or Mn and has a surface roughness of 0.5 S or less. It also contains 0.5-10.0 wt.% Mg. |