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filingDate 1984-05-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e9729f1e6f468e0c01b28792219aabc2
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publicationDate 1984-12-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber DE-3418401-A1
titleOfInvention ELECTROPHOTOGRAPHICALLY SENSITIVE COMPONENT
abstract Electrophotographically sensitive element, having photoconductive amorphous Si layer(s) on an Al-based substrate, has a substrate contg. Fe and/or Mn in an amt. of max. 0.30 wt.%. The substrate contains max. 0.30 wt.% Fe and/or Mn and has a surface roughness of 0.5 S or less. It also contains 0.5-10.0 wt.% Mg.
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