| abstract |
A process for plasma-chemical production of a fine-disperse charging material for composite materials or sintered metals, containing oxygen-free refractory metal compounds and binder metals, comprises introducing the starting components into the stream of a low-temperature nitrogen plasma with simultaneous mixing of the reaction mixture and subsequent condensation of the reaction products. The starting components used for obtaining oxygen-free metal compounds are substances which, in the stream of a low-temperature nitrogen plasma, form carbonitrides and/or nitrides of the transition metals from groups IV and V of the periodic table of the elements, and the starting components used for obtaining binder metals are metals or metal compounds which do not form nitrides or carbonitrides in the stream of a low-temperature nitrogen plasma, the components used for obtaining binder metals being introduced into the stream of a low-temperature nitrogen plasma with the delay of 10<-7> to 10<-1> second. |