| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2fb8efa277b88a39948a0bfb308eca4e |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-008 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F26-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-008 |
| filingDate |
1982-04-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_72d8851212775cef9a21f2efb426a5aa
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5c53da895a6da5f5d488590576fbcfea
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9856e1aa26d74fb0d195d66276d47215 |
| publicationDate |
1982-11-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
DE-3213771-A1 |
| titleOfInvention |
LITHOGRAPHIC COVER AND METHOD FOR THE PRODUCTION THEREOF |
| abstract |
A negatively functioning masking medium and a medium for production of microlithographic recordings contains a vinyl polymer which has pendant groups containing aromatic quaternised nitrogen. If the masking medium is exposed to the action of electron beams, ultraviolet light or X-rays, it undergoes a conversion from a state of high solubility to a state of low solubility in polar solvents, e.g. water or alcohols of low molecular weight. A process for pattern formation on substrates using the masking medium is furthermore disclosed. <IMAGE> |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0321856-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0321856-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5512418-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0615162-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0615162-A2 |
| priorityDate |
1981-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |