| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c3070783318d4f17db6ad97e418a5503 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32935
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01B7-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F4-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01B7-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F4-00 |
| filingDate |
1981-10-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_99bdbaba5ac86b0da7387261fde98ff8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5ce4c082a24effa71e0423046107cb7e |
| publicationDate |
1983-07-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
DE-3142333-A1 |
| titleOfInvention |
METHOD FOR DETERMINING CORROSION IN PLASMA |
| abstract |
In a method for determining the etching erosion in plasma etching, the DC voltage between the anode and cathode of the etching device is measured during plasma etching, and a change in DC voltage detected in the process is used to determine the etching erosion. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0200952-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0200952-A3 |
| priorityDate |
1981-10-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |