http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-2749733-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4ddcb273a108a5d8472b335280098e06 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C15-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-04 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C15-00 |
| filingDate | 1977-11-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_334566d5c66d99d7834226fd6fcc7bc3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2937c5dbf63c85b0b4cd8620f4438285 |
| publicationDate | 1979-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | DE-2749733-A1 |
| titleOfInvention | PROCESS FOR ETCHING THIN TIN DIOXIDE LAYERS |
| abstract | Thin tin dioxide layers, for use in formed transparent electrodes to produce luminous symbol displays, are etched by wetting in a first zone the substrate, covered with an aqueous zinc powder paste, by a metered supply of hydrochloric acid to keep the hydrogen release and the tin oxide reduction uniform. In a second zone, a copious supply of hydrochloric acid removed the zinc powder residue and cuts short the reduction. This is a simple process to etch the difficult tin dioxide layers and to reduce under-etching to a minimum under optimum conditions. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-3047218-A1 |
| priorityDate | 1977-11-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 27.