http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-2518479-A1

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-143
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30
filingDate 1975-04-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4237b7484920cfd808cd331d6277de33
publicationDate 1975-12-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber DE-2518479-A1
titleOfInvention METHOD OF PRODUCING A POSITIVE RESIST MASK THAT IS PERMANENT TO RADIATION OF HIGH ENERGY
priorityDate 1974-05-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID407219005
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID7909
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419512635
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID11448
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID411746874
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID962

Total number of triples: 20.