http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-2462196-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4ddcb273a108a5d8472b335280098e06 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0388 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate | 1974-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a14aca620283980c7fff27155cd85c84 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a74aa423c5f2eecfda1864c843611a2a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e06cdd26b700f69c78d586f57642d802 |
| publicationDate | 1976-05-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | DE-2462196-A1 |
| titleOfInvention | PROCESS FOR PRODUCING RADIATION-SENSITIVE, SOLUBLE POLYMERIC COMPOUNDS |
| abstract | Thermostable soluble relief structures, esp. photoresists for electrotechnology, are prepd. by (a) applying a soluble radiation-sensitive prepolymer to a substrate, (b) irradiating the prepolymer through a negative, (c) removing the non-irradiated prepolymer, e.g. with a solvent, and (d) curing the relief structure. The prepolymer is prepd. by polycondensing (I) primary diamines with (II) diester-bischlorides of bicyclo-2, 2, 2-octene-7-tetracarboxylic acids carrying radiation-reactive residues linked by an ester bond, these residues being situated in the ortho-position relative to the acid chloride groups, and the radiation-reactive groups of formula (I)-(IX) (where R' is alkylene or aralkylene; R2 is H, CH3 or Cl; R3 is H; R4 is H or CH3; R5 is oxyalkyl; R6 is alkyl, phenyl, alkoxyphenyl, or halophenyl; R7 is H, Cl, alkyl or alkoxy; R8 is an aromatic carbocyclic residue linked by means of a ring C atom; and n is 1 or i). The prepolymer is prepd. in hexamethylphosphortnamide as solvent. The structures have good resistance to high temps. are prepd. by a simple, economical prepn. The pre-polymer is rapidly crosslinked by radiation and is easily removed by org. solvents, but is resistant to corrosive aqs. liquids. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5510527-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5336409-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0556569-A3 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0556569-A2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0024592-A1 |
| priorityDate | 1974-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 47.