http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-2462101-A1
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4ddcb273a108a5d8472b335280098e06 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0388 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
filingDate | 1974-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e06cdd26b700f69c78d586f57642d802 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_04804ada53cbbeb1eaad8d240c8b01d1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a14aca620283980c7fff27155cd85c84 |
publicationDate | 1976-04-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | DE-2462101-A1 |
titleOfInvention | PROCESS FOR PRODUCING RADIATION-SENSITIVE, SOLUBLE POLYMERIC COMPOUNDS |
abstract | In the parent patent relief structures are prepd. from thermostable polymers, e.g. protective layers on semiconductors, insulation layers on printed circuits, and printing plates, by using prepolymers based on polyaddition or polycondensation prods. of radiation-sensitive carboxylic or heterocyclic cpds. that are formed with diamines, diisocyanates, dicarboxylic acids or bis-(acid chlorides). In the patent of addtn. the carboxylic groups bonded in ester form are replaced by radiation sensitive groups that are bonded in the form of carboxylic esters, and have the structures: (where R' is alkylene or aralkylene; R2 is H, CH3, or Cl; and R3 is H). |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0140273-A3 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0140273-A2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0187517-A3 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0187517-A2 |
priorityDate | 1974-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 44.