http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-2462101-A1

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
filingDate 1974-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e06cdd26b700f69c78d586f57642d802
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_04804ada53cbbeb1eaad8d240c8b01d1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a14aca620283980c7fff27155cd85c84
publicationDate 1976-04-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber DE-2462101-A1
titleOfInvention PROCESS FOR PRODUCING RADIATION-SENSITIVE, SOLUBLE POLYMERIC COMPOUNDS
abstract In the parent patent relief structures are prepd. from thermostable polymers, e.g. protective layers on semiconductors, insulation layers on printed circuits, and printing plates, by using prepolymers based on polyaddition or polycondensation prods. of radiation-sensitive carboxylic or heterocyclic cpds. that are formed with diamines, diisocyanates, dicarboxylic acids or bis-(acid chlorides). In the patent of addtn. the carboxylic groups bonded in ester form are replaced by radiation sensitive groups that are bonded in the form of carboxylic esters, and have the structures: (where R' is alkylene or aralkylene; R2 is H, CH3, or Cl; and R3 is H).
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0140273-A3
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priorityDate 1974-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 44.