| abstract |
Photo-sensitive material consists of a support coated with a photo-sensitive Ag halide emulsion layer, where >=1 of layers forming the photo-sensitive material contains an added dispersion of a reactive polymer, having 0.5 mu particles size and >=10000 mol wt and which is prepd by polymsn of a mixt contg. acrolein as well as a polymer dispersion consisting of the emulsion polymerisation prod. (I) of a monomeric starting material contg. butadiene, vinylidene chloride, vinyl acetate and/or an alkyl acrylate. (I) may also be a copolymer of >=1 monomer(s) listed with another vinyl monomer, esp. styrene and/or alkyl methacrylates. |