| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_647cfec32e3dd66eeb2824da617986a5 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2218-365 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C17-3417
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01B3-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01B3-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05B33-22 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05B33-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01B3-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01B3-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C17-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05B33-12 |
| filingDate |
1999-07-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c1138b2ba0a30394ba62d8d5a03c52aa
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3b3950b80d65028d7cfda8cd20f2e560 |
| publicationDate |
2000-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
DE-19934153-A1 |
| titleOfInvention |
Insulating film for thin film structures |
| abstract |
The present invention relates to an insulating film of a thin film structure deposited on a substantially alkali metal free glass substrate having alternating structures of alumina and titanium oxide, and to an electroluminescent thin film device in which the insulating film is included as an insulating layer between the phosphor layer and the electrode layers is. In the insulating film, the ratio between the cumulative thicknesses of the titanium oxide and the aluminum oxide is less than 0.75, and, due to the ratio lower than in the prior art, good resistance to film tear is obtained. |
| priorityDate |
1998-07-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |