http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-19907700-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L25-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F8-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-17 |
| filingDate | 1999-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1df85eaaecb43cea07de301f902d62d2 |
| publicationDate | 1999-10-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | DE-19907700-A1 |
| titleOfInvention | Polymer material for a photoresist, photoresist composition containing the same, and manufacturing method therefor |
| abstract | The invention relates to a polymer material for a chemically amplified photoresist, to a photoresist composition containing such a polymer material and to a method for producing such a polymer material. DOLLAR A According to the invention, a polymer material is provided which is polymerized from three or more different monomers and has an acid-unstable dialkylmalonate group bonded to the polymer main chain. A photoresist composition according to the invention contains such a polymer material and a photosensitive acid generator. According to the invention, the polymer material can be obtained by polymerizing dialkylmalonylmethylstyrene, alkoxystyrene or alkoxystyrene derivative or (meth) acrylate derivative and acetoxystyrene or acetoxystyrene derivative to obtain a terpolymer and then deacetylating the same. DOLLAR A use e.g. B. for photoresists in photolithography. |
| priorityDate | 1998-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 60.