| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L25-18 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L25-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L65-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L25-00 |
| filingDate |
1999-02-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2009-09-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1df85eaaecb43cea07de301f902d62d2 |
| publicationDate |
2009-09-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
DE-19905568-B4 |
| titleOfInvention |
Polymer blend for a photoresist and photoresist composition containing this blend |
| abstract |
Polymer mixture for a chemically amplified photoresist, with A polymer A polymerized with two or more different monomers and having an acid-labile dialkyl malonate group bonded to the main polymer chain, and A polymer B polymerized with a (meth) acrylate derivative monomer or an alkoxystyrene monomer and one or more other monomers, - wherein the two polymers A and B are present mixed in a mixing ratio between 0.1: 0.9 and 0.5: 0.5. |
| priorityDate |
1998-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |