http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-19860634-A1

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filingDate 1998-12-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 1999-07-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber DE-19860634-A1
titleOfInvention Method for reducing the damage caused by electrostatic discharge and imaging when defining the writing width of a magnetoresistive head with the aid of a focused ion beam
abstract Electrostatic discharge damage is prevented during a focused ion beam machining operation by pre-coating the surface to be machined with a conductive film coating which extends to an earthed substrate surface. Independent claims are also included for the following: (i) production of a magnetoresistive read/write head by photolithographic formation of the head on a slide piece block surface, application of a conductive film on the head and the block surface, focused ion beam machining of part of the head, plasma chemical removal of the conductive film and fine grinding of the block to form an air bearing surface; (ii) a magnetoresistive read/write head produced by the above process (i); and (iii) a magnetoresistive read/write head for use in a hard disk data storage unit. Preferred Features: The conductive film is a carbon film, a silicon/carbon multilayer film or a silicon carbide film.
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