| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c0f7e3fa7ac7395dee357c166ef30e65 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2217-49207 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J9-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-184
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J11-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J9-14 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J9-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J9-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-18 |
| filingDate |
1998-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b0b19ee749e50964dea7140d8ca1f21f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_03bdc4a03d8e173f73d8bc4ee1445ada
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9b701a251ad0bb0bd44721254a0b4a03
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0ec94acdd2044b2a3fbe58b475b05705 |
| publicationDate |
2000-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
DE-19841900-A1 |
| titleOfInvention |
Process for applying metallic conductor tracks as electrodes on a channel plate for large flat screens |
| abstract |
Modern large flat screens, known as PDPs and PALCs, have a glass plate with a micro-channel structure and an addressing electrode in each channel. DOLLAR A So far, the addressing electrodes have been applied by means of printing technology or by sputtering directly selectively according to the channel structure or indirectly by selective etching away of large areas without external current and / or galvanically deposited metal layers while leaving the conductor track structures. DOLLAR A To avoid the disadvantages of these known methods, the invention provides for the metallic conductor tracks of the addressing electrodes to be applied selectively only in the electrode regions by means of the electroless and / or galvanic deposition methods. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-0169640-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-10011455-B4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-10011455-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-10026974-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-0169640-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-10026976-C2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-10026976-A1 |
| priorityDate |
1998-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |