http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-19841777-C1
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a2bcaf91101a370a3d64e3190366357f http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c1edba6a59115727a1d0ef11e3006692 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-274 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-27 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 |
filingDate | 1998-09-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2000-01-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5703344f42a481447e401df6f90dc7d6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9a97b3e73eb99267720797c627664a22 |
publicationDate | 2000-01-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | DE-19841777-C1 |
titleOfInvention | Device for the plasma-technical deposition of polycrystalline diamond |
abstract | In a device for the plasma-technical deposition of polycrystalline diamond on large-area substrates (5) with a process chamber (1) with lock (6a), there are a plurality of mutually parallel and arranged in a common plane above the substrates (5), which extend transversely to the substrate conveying direction line-shaped microwave plasma sources (9, 9 ', ...) and gas feed and gas discharge pipes (10, 10', ..., 11, 11 ', ..., 12, 12', .. opening into the process chamber (1) ., 13, 13 ', ..., 13a, ...) are provided, with each of the line sources (9, 9', ...) each being assigned a plurality of gas supply and exhaust pipes arranged distributed over the length of the source, and wherein the outlet openings of the gas supply pipes are each directly above the line source (9, 9 ', ...) and the openings of the gas discharge pipes (13, 13', ...) each in the area between two line sources (9, 9 ', ...) .) and on a level that is roughly defined by the soul axis en (5) of the line sources (9, 9 ', ...) extends. |
priorityDate | 1998-09-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 22.