| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a2bcaf91101a370a3d64e3190366357f |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-3142
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-3132
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-022 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-0031
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4404
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-028
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-021 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44 |
| filingDate |
1998-07-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c0e1a39af5d2b75f069110ed023396d8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6868ed63b24f339795aa05c23bf64f3c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b800ba347d054f6dc1b4a660eb5c76ce
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fff4f6f6b8b7ea5ee824f904832ba575 |
| publicationDate |
2000-02-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
DE-19833718-A1 |
| titleOfInvention |
Process for reducing particle release and particle absorption from a surface |
| abstract |
The invention relates to a method for reducing the particle release and particle absorption of a surface, in particular the surface of a wafer support in semiconductor production. DOLLAR A The reduction in particle transfer is achieved by coating the surface, which is created in a high vacuum by simultaneous vapor deposition of the surface with solid atoms and bombardment with ions. The solid atoms and the ions are applied to the surface in a stoichiometric ratio and are selected so that they form a hard layer. Before coating, the surface is cleaned and, if necessary, degreased. DOLLAR A The method according to the invention extends the service life of the coated surface in semiconductor production, since the cleaning effort is less necessary due to reduced contamination. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-10334940-B4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-10334940-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2365513-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/FR-2957455-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9099278-B2 |
| priorityDate |
1998-07-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |